Work with Mott to Achieve Longer Tool Uptimes and Better Factory Throughput
Improving tool uptime and tool throughput is critical to achieving better factory yields. Without careful tool operation, proper maintenance and compatible system components, tools can sit idle up to 60% of the time. Most of that time is due to scheduled maintenance or unexpected down time.
Mott Point of Use Fiber Metal Gas Filters have been proven to help fabs improve tool uptime with dry down in minutes – not hours – allowing tools to be commissioned faster during tool start up or after maintenance shutdowns. In addition, the fiber metal media offer 1.5 nm particle capture, 2X the industry’s 3 nm standard. Mott Diffusers have been proven to increase tool wafer throughput by as much as 10-20% by eliminating particle disturbances in the chamber during vent up from vacuum to atmosphere conditions. The continual vent up cycles have been known to stress competitive diffusers to the point of early failure. Mott’s Diffusers have been tested to withstand 3 million vent cycles, eliminating costly material failures and reducing maintenance requirements.
|Mott Point of Use Gas Fiber Metal Filters
For use in OEM tool gas boxes, UHP gas sticks for semiconductor tool hook-up, UHP process gas filtration in valve manifold boxes, gas cabinets, tool isolation gas boxes, or any process requiring ultra high purity particle removal.
|1.5 nm Particle Capture
Mott has co-developed a new test with the University of Minnesota’s Particle Technology Laboratory that can now create test particles and measure filter efficiency down to 1.5 nm (0.0015 µm) particles. This is 2X smaller particle retention than the current industry standard of 3 nm. Mott’s development of proprietary manufacturing techniques has created metal filter media that meet this efficiency without contributing to filter pressure drop.
Use Mott diffusers with gases in vent applications on load lock chambers, transfer chambers, cooling chambers, and process chambers or Semiconductor equipment interfaces (CVD, PVD, Etch, Epi) or other vacuum chambers.