The Next Wave of Semiconductor Growth: High-Purity Gas Filtration

The semiconductor industry is undergoing a rapid transformation, driven by advancements in AI, high-performance computing (HPC), automotive electronics, and IoT applications. In response to rising demand, 18 new fabrication plants (fabs) are slated to break ground in 2025, contributing to an estimated 6.6% year-over-year increase in global semiconductor capacity (SEMI.org). However, this growth introduces new challenges—fabs must ensure that production environments remain pure as operations scale at an unprecedented rate.

Contamination control is a cornerstone of semiconductor manufacturing, as even sub-micron particles or molecular impurities can lead to defectivity, yield loss, and instability. Mott’s advanced porous metal filtration and flow control solutions play a pivotal role in maintaining ultra-clean environments for both leading-edge nodes and mature technology nodes.

Ultra-Pure Gas Delivery: A Critical Process Variable

A filtration system that exceeds industry standards can provide a competitive edge by reducing defects and extending service life. High-purity gases are vital in semiconductor manufacturing because even trace particulates or molecular impurities can induce nanoscale defects, modify film properties, and compromise electrical performance.

Mott’s Bulk Gas Filtration: 9-Log Particle Reduction Down to 0.0015 μm

Mott engineers its Bulk Gas Filters to meet the semiconductor industry’s strictest purity standards by providing:

• 9-log (99.9999999%) removal efficiency of sub-micron particles down to 0.0015 μm
• All-metal porous media, eliminating outgassing and shedding concerns associated with polymer-based alternatives
• Minimal differential pressure, ensuring efficient gas flow with optimized filtration performance
• Longer service life and superior thermal stability compared to conventional filtration materials

Performance Under Extreme Conditions: Heated Dry-Down Applications

Following filtration, gas streams typically undergo heated dry-down cycles, during which extreme temperatures remove residual contaminants before critical process steps. Conventional filtration media may degrade under these conditions, leading to shedding, failure, or efficiency loss.

Mott’s filters are specifically designed to withstand elevated temperatures and high gas flow rates, ensuring:

• Consistent filtration performance in high-temperature environments
• Use of  inert, corrosion-resistant materials that minimizing risk of leaching or particle release
• Increased process uptime by reducing the need for frequent maintenance or filter replacements

Scaling Semiconductor Manufacturing with High-Purity Filtration

As semiconductor fabs scale up to meet growing demand, maintaining process consistency, purity, and operational efficiency is essential for maximizing yield and reducing wafer scrap. High-purity gas filtration minimizes contamination risks throughout the gas supply chain down to the wafer level. Mott remains at the forefront of semiconductor gas filtration, providing engineered solutions that deliver superior purity, performance, and longevity. Its expertise enables fabs to optimize yield, reliability, and cost-efficiency in an increasingly demanding industry landscape.

Learn more about Mott’s high-purity semiconductor filtration solutions here. If you have specific requirements, contact Mott for a custom solution tailored to your process needs.