Mott Unveils Cutting Edge Filtration Technology at Semicon West 2016
Mott Corporation is currently attending SEMICON West 2016, engaging with key tool manufacturers and distributors. We are rolling out several new products at these meetings including an industry shaping development in the realm of sub-micron particle filtration that brings gas filtration up to par with contamination control needs of the current and future line nodes.
Along with this announcement are presentations of key developments in the filtration and flow control of organometallic precursor materials which have grown very popular in the advancement of Atomic Layer Deposition for 3D and Fin-Fet chip manufacturing.
The High Purity division of Mott has been actively developing new medias for use in load lock and wafer handling atmospheric control allowing for optimal vent up, reduced particle contamination and the industry’s most durable diffusion technology allowing for 3X the current lifetime of existing products.
For questions and meeting requests, contact Kevin McGuffin (firstname.lastname@example.org) or Sean Kane (email@example.com) if you plan to be at the show or in San Francisco.